Optical Sputtering and Evaporation Continuous Coating Equipment

  Features  

·Plasma and graphite target pretreatment to effectively improve theadhesion of the thin film layers; 

·Dual sputtering process chambers, ensuring coating time is reducedby half compared to single chamber and enables shorter cycle time; 

·Multiple sets of sputtering targets to realize high-efficiency depositionof various materials; 

·Stepless adjustable of spacing between multiple evaporation boats,fine-tuning of ES distance and precise controlling of dosing volume insyringe pump to ensure anti-oil performance of the product; 

·Large diameter coating drum design combined with customizedsubstrate hanging solution, significantly improves throughput; 

·Automatic handling of substrate loading & unloading, integrated withdoor valve and track safety detection, guarantees safe operation.